Helium Ion Microscopy 1st Edition by Gregor Hlawacek 3319419909 9783319419909

Helium Ion Microscopy 1st Edition by Gregor Hlawacek – Ebook PDF Instant Download/DeliveryISBN:  3319419909, 9783319419909 

Full download Helium Ion Microscopy 1st Edition after payment.

Product details:

ISBN-10 :  3319419909

ISBN-13 :  9783319419909

Author:  Gregor Hlawacek  

This book covers the fundamentals of Helium Ion Microscopy (HIM) including the Gas Field Ion Source (GFIS), column and contrast formation. It also provides first hand information on nanofabrication and high resolution imaging. Relevant theoretical models and the existing simulation approaches are discussed in an extra section. The structure of the book allows the novice to get acquainted with the specifics of the technique needed to understand the more applied chapters in the second half of the volume. The expert reader will find a complete reference of the technique covering all important applications in several chapters written by the leading experts in the field. This includes imaging of biological samples, resist and precursor based nanofabrication, applications in semiconductor industry, using Helium as well as Neon and many more. The fundamental part allows the regular HIM user to deepen his understanding of the method. A final chapter by Bill Ward, one of the pioneers of HIM, covering the historical developments leading to the existing tool complements the content.

Helium Ion Microscopy 1st Table of contents:

1 The Helium Ion Microscope
Abstract
1.1 Introduction
1.2 The GFIS Gun
1.3 Cryogenic Cooling
1.4 Vacuum System
1.5 Gas Delivery System
1.6 The Ion Optical Column
1.7 Beam Induced Damage
1.8 Detectors and Signal Chain
1.9 Vibrational Considerations
1.10 Conclusion
References
2 Single Atom Gas Field Ion Sources for Scanning Ion Microscopy
2.1 Introduction
2.2 FIM Details
2.2.1 Anatomy of Gas-Assisted Etching
2.2.2 Precursor Tip
2.2.3 SAT Shaping
2.2.4 SAT Reproducibility
2.2.5 Air Exposure, Thermal Stability, and Faceting
2.2.6 Iridium and Other Nanotip Materials
2.3 Performance of SATs
2.3.1 Best Imaging Voltage
2.3.2 Temperature Dependence
2.3.3 Shape Dependence
2.3.4 Current Stability
2.4 Conclusions
References
3 Structural Changes in 2D Materials Due to Scattering of Light Ions
3.1 Introduction
3.2 The Scattering Process
3.2.1 Elastic Scattering
3.2.2 A Note on Inelastic Scattering
3.3 Target Evolution Under Ion Impacts
3.3.1 After the Binary Collision
3.3.2 Molecular Dynamics Simulations of Ion Impacts on 2D Materials
3.3.3 Influence of Multiple Impacts
3.3.4 A Brief Note on the Substrate
3.4 Results
3.4.1 Graphene
3.4.2 Experimental Results
3.4.3 Other 2D Materials
3.5 Summary
References
4 Monte Carlo Simulations of Focused Ion Beam Induced Processing
4.1 Introduction
4.2 An Example of Monte Carlo Simulation: EnvizION Simulator
4.2.1 Material Database
4.2.2 Ion Beam Profile
4.2.3 Nuclear Energy Loss
4.2.4 Electronic Energy Loss and Stopping Cross-Section
4.2.5 Ion and Recoil Trajectories
4.2.6 Secondary Electrons
4.2.7 Precursor Gas Handling
4.2.8 Deposition and Etching
4.2.9 Sputtering Algorithms
4.3 Monte Carlo Simulations of Physical Sputtering
4.3.1 Sputtering of Aluminum and Tungsten
4.3.2 Sputtering of Copper
4.4 EUV Mask Repair
4.5 Resolution Limiting and Sputtering Limiting Effects
4.6 Summary
References
5 Secondary Electron Generation in the Helium Ion Microscope: Basics and Imaging
Abstract
5.1 Introduction
5.2 The Processes of Secondary Electron Generation in the Helium Ion Microscope
5.3 SE Energy Distribution in HIM
5.4 Imaging with SE
5.4.1 Topographic Yield
5.4.2 SE2/SE1 Ratio
5.4.3 SE3
5.4.4 Material Characterization by SE Contrast Measurements with Energy Filtering
5.5 Imaging Utilizing a High SE Yield in HIM: Ion-to-SE Conversion
5.5.1 Scanning Transmission Ion Microscopy (STIM) with SE Detector
5.5.2 Reflection Ion Microscopy
5.6 Summary
References
Microscopy
6 Introduction to Imaging Techniques in the HIM
6.1 Introduction
6.2 Imaging Signals and Contrast Mechanisms
6.2.1 Secondary Electrons
6.2.2 Backscattered Ions
6.2.3 Transmitted and Reflected Ions
6.2.4 Photons
6.3 HIM Imaging Techniques
6.3.1 High Resolution Imaging
6.3.2 Charge Neutralization
6.3.3 Imaging with a Large Depth of Field
6.4 Conclusions
References
7 HIM of Biological Samples
7.1 Introduction
7.2 Large Depth of Field Bioimaging
7.3 Summary
References
8 HIM Applications in Combustion Science: Imaging of Catalyst Surfaces and Nascent Soot
Abstract
8.1 Introduction
8.2 Organic Nanoparticles: Nascent Soot Analysis
8.2.1 Introduction: Soot
8.2.2 Soot Sampling
8.2.3 Imaging of Soot
8.2.4 Analysis of Soot from Ethylene Flames
8.2.5 Imaging of Soot from Different C4 Fuels
8.2.6 Summary: Imaging of Nascent Soot
8.3 CVD-Grown Films of Transition Metal Oxides
8.3.1 Introduction
8.3.2 Binary Mixtures of TMOs
8.3.3 Summary: Imaging PSE-CVD Grown Films
8.4 Summary and Conclusions
Acknowledgments
References
9 Channeling and Backscatter Imaging
9.1 Introduction
9.2 Directional Effects in Ion Solid Interaction
9.2.1 Ion Channeling
9.2.2 Directional Effects in Secondary Electron Emission
9.3 Mapping of Crystal Orientation in the Ion Microscope
9.4 Imaging with Ions
9.4.1 Backscattered Helium Versus Electrons for Image Generation
9.4.2 Subsurface Imaging
9.5 Dechanneling Contrast
9.5.1 Dechanneling by Thin Films
9.5.2 Dechanneling by Lattice Distortions
9.6 Summary
References
10 Helium Ion Microscopy of Carbon Nanomembranes
Abstract
10.1 Introduction
10.2 A Comparison Between HIM and SEM
10.3 CNMs on Solid Supports
10.4 HIM Imaging of Free-Standing CNMs (Porous Supports and TEM Grids)
10.5 Visualization of Large Area CNMs
10.6 Imaging of Hybrid and Composite Systems
10.7 Imaging of Perforated CNMs
10.8 Lithography with Nanomembranes
10.9 Summary
Acknowledgments
References
11 Helium Ion Microscopy for Two-Dimensional Materials
Abstract
11.1 Graphene Characterization
11.1.1 Lateral Dimension
11.1.2 Thickness and Work Function
11.1.3 Surface Contamination
11.1.4 Charge Compensation Effect on Graphene Imaging
11.1.5 Influence of Beam-Induced Contamination
11.2 HIM Modification of Two-Dimensional Materials
11.2.1 Controllable Defect Creation in 2D Materials
11.2.2 Nano-Patterning of 2D Materials Using HIM
References
Analysis
12 Backscattering Spectrometry in the Helium Ion Microscope: Imaging Elemental Compositions on the n
12.1 Introduction
12.2 Principles of Rutherford Backscattering Spectrometry
12.3 Challenges in Performing Rutherford Backscattering Spectrometry in the Helium Ion Microscope
12.3.1 Screening Effects and Cross Sections
12.3.2 Dual, Plural and Multiple Scattering
12.3.3 Charge Fraction
12.3.4 Sputtering
12.4 Experimental Approaches
12.4.1 Solid State Detectors
12.4.2 Electrostatic Analyzers
12.4.3 Time of Flight Spectrometry
12.5 Pulsed Primary Beam ToF-BS
12.5.1 Experimental Setup
12.5.2 Backscattering Spectra and Simulation
12.5.3 Imaging in ToF-BS Mode
12.5.4 Time of Flight Secondary Ion Mass Spectrometry
12.6 Summary
References
13 SIMS on the Helium Ion Microscope: A Powerful Tool for High-Resolution High-Sensitivity Nano-Anal
Abstract
13.1 Secondary Ion Mass Spectrometry
13.1.1 Introduction
13.1.2 Underlying Fundamentals
13.1.2.1 Sputtering Processes
13.1.2.2 Ionisation of Sputtered Matter
13.1.2.3 Matrix Effect and Quantification
13.1.3 Instrumentation
13.1.4 SIMS Applications
13.2 Fundamental Aspects of SIMS Performed Under He+ and Ne+ Bombardment
13.2.1 Dimensions of Collision Cascades
13.2.2 Sensitivity
13.2.3 Detection Limit Versus Pixel/Voxel Size
13.3 Instrumentation for SIMS Performed on the HIM
13.3.1 Instrumental Constraints
13.3.2 Prototype Instrument for SIMS Performed on the HIM
13.4 SIMS Applications on the HIM
13.4.1 Mass Spectra
13.4.2 Depth Profiling
13.4.3 Imaging
13.4.4 Correlative Microscopy
13.5 Conclusions
Acknowledgments
References
14 Ionoluminescence
14.1 Introduction
14.2 Ionoluminescence in HIM
14.2.1 Semiconductors
14.2.2 Alkali Halides
14.2.3 Other Minerals
14.2.4 Immunofluorescence
14.3 IL Patterning
14.4 Interaction Volume Measurements Using IL
14.5 Summary
References
Modification
15 Direct–Write Milling and Deposition with Noble Gases
Abstract
15.1 Nanostructuring with Focused Noble Gas Ion Beams
15.2 FIB Milling with Noble Gas Ions
15.2.1 Bulk Material
15.2.1.1 Sputtering Resolution and Yield: He FIB
15.2.1.2 Sputter Resolution and Yield: Xe and Ne FIB
15.2.1.3 Limitations and Unwanted Artifacts
15.2.1.4 Examples of Applications
15.2.2 Membranes
15.2.2.1 Thick Membranes
15.2.2.2 Thin Membranes
15.3 Gas Assisted Deposition with Noble Gas Ions
15.3.1 Deposition Regimes: Reaction Limited Versus Mass-Transport Limited
15.3.1.1 Beam Scan Parameters and Scan Strategies
15.3.2 Adsorbate Dissociation: ESA, SE, and Thermal Spikes
15.3.3 Lateral Resolution
15.3.3.1 Low Aspect Ratio Structures
15.3.3.2 High Aspect Ratio Structures
15.3.4 Deposit Composition and Internal Structure
15.4 Gas Enhanced Etching with Noble Gas Ions
15.5 Summary
Acknowledgements
References
16 Resist Assisted Patterning
Abstract
16.1 Introduction to Lithography
16.2 Helium Ion Beam-Resist Interaction
16.2.1 Primary Beam Scattering (Forward Scattering)
16.2.2 Secondary Electron (SE) Generation
16.2.3 Backscattering of the Primary Beam
16.3 HIL Experimental Results on EBL Resists
16.3.1 Contrast and Sensitivity
16.3.2 Resolution
16.3.3 Point-Spread Function (PSF)
16.4 HIL Applications
16.4.1 Pre-screening of EUV Resists
16.4.2 Fabrication of Nanoimprint Templates
16.5 HIL Dose Optimization Modelling
16.6 HIL Versus Milling
16.7 Conclusions and Outlook
Acknowledgments
References
17 Focused Helium and Neon Ion Beam Modification of High-TC Superconductors and Magnetic Materials
Abstract
17.1 Introduction
17.2 Introduction to Ion Beam Modification of Superconductors
17.2.1 Josephson Junctions
17.2.2 Ion Irradiation in High-TC Superconductors
17.3 Ion Irradiated Josephson Junctions
17.3.1 Masked Ion Irradiated Josephson Junctions
17.3.2 GFIS Direct-Write Josephson Junctions
17.3.3 GFIS Direct Write Superconducting Quantum Interference Devices
17.3.4 Nanowire Josephson Junctions
17.3.5 Concluding Remarks on GFIS Fabricated High-TC Josephson Junctions
17.4 Nanoscale Manipulation of Magnetization Using GFIS
17.4.1 The Effect of Ion-Irradiation on Certain B2 Alloy Thin Film
17.4.2 Application of Nanofocussed Ne+ Beam to B2 Alloy Thin Films
17.4.3 Future Scope of GFIS-Assisted Magnetic Writing
17.5 Conclusions
References
18 Helium Ion Microscope Fabrication of Solid-State Nanopore Devices for Biomolecule Analysis
Abstract
18.1 Introduction
18.2 HIM Milling of SS-Nanopores
18.2.1 Nanopore Formation
18.2.2 DNA Translocation
18.2.3 Nanopore Arrays
18.2.4 Applications of HIM Drilled Nanopores
18.3 Manipulation of Device Thickness
18.3.1 Membrane Thinning
18.3.2 HIM Control of SS-Nanopore Device Dimensions
18.3.3 Applications of HIM-Thinned SS-Nanopores
18.4 Manipulating Intrinsic Membrane Fluorescence
18.4.1 HIM Photoluminescence Reduction
18.4.2 Application of HIM Photoluminescence Reduction
18.5 Conclusions and Outlook
References
19 Applications of GFIS in Semiconductors
Abstract
19.1 Introduction
19.2 GFIS Nanomachining Characteristics
19.2.1 Charged Particle Interaction with Materials
19.2.2 Charged Particle Interaction in Bulk Versus Membrane Substrates
19.2.3 Ion Beam Probe Current Distribution
19.3 Applications of GFIS in Semiconductors
19.3.1 Helium Applications
19.3.1.1 Helium Ion Microscopy
19.3.1.2 Voltage Contrast Imaging
19.3.1.3 Doping Contrast Imaging
19.3.1.4 Mask Repair
19.3.2 Neon Applications
19.3.2.1 Circuit Edit
19.3.2.2 Circuit Timing Invasiveness
19.3.2.3 Fault Isolation
19.3.2.4 TEM Lamella Preparation
19.4 GFIS Damage Mitigation
19.5 Future of GFIS Applications in Semiconductors

People also search for Helium Ion Microscopy 1st:

helium ion microscope
    
helium ion microscope price
    
helium ion microscope vs sem
    
helium ion model
    
a helium ion

Tags: Helium Ion, Microscopy, Gregor Hlawace, Gas Field